ASTM-F95 2000
$40.63
F95-89(2000) Standard Test Method for Thickness of Lightly Doped Silicon Epitaxial Layers on Heavily Doped Silicon Substrates Using an Infrared Dispersive Spectrophotometer (Withdrawn 2003)
| Published By | Publication Date | Number of Pages |
| ASTM | 2000 | 8 |
ASTM F95-89-Reapproved2000
Withdrawn Standard: Standard Test Method for Thickness of Lightly Doped Silicon Epitaxial Layers on Heavily Doped Silicon Substrates Using an Infrared Dispersive Spectrophotometer (Withdrawn 2003)
ASTM F95
Scope
This standard was transferred to SEMI (www.semi.org) May 2003
1.1 This test method provides a technique for the measurement of the thickness of epitaxial layers of silicon deposited on silicon substrates. A dispersive infrared spectrophotometer is used. For this measurement, the resistivity of the substrate must be less than 0.02[omega] cm at 23oC and the resistivity of the layer must be greater than 0.1[omega] cm at 23oC.
1.2 This technique is capable of measuring the thickness of both n– and p-type layers greater than 2 µm thick. With reduced precision, the technique may also be applied to both n– and p-type layers from 0.5 to 2 µm thick.
1.3 This test method is suitable for referee measurements.
1.4This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.
Keywords
epi; epi thickness; epitaxial layer; FTIR; index of refraction; IR; layer thickness; spectrophotometer
ICS Code
ICS Number Code 29.045 (Semiconducting materials)
DOI: 10.1520/F0095-89R00
PDF Catalog
| PDF Pages | PDF Title |
|---|---|
| 1 | Scope Referenced Documents Terminology |
| 2 | Summary of Test Method Apparatus Test Specimen Preparation of Apparatus Procedure FIG. 1 |
| 3 | Calculation TABLE 1 |
| 4 | Report Precision and Bias TABLE 2 TABLE 3 |
| 5 | Keywords X1. THEORY OF METHOD X1.1 X1.2 X1.3 X1.4 X1.5 X1.6 X1.7 X1.8 FIG. X1.1 |
| 6 | X1.9 X1.10 X1.11 X2. REPEATABILITY AND REPRODUCIBILITY OF MULTILABORATORY TESTING USING FT-IR INSTRUMENTS X2.1 X2.2 X2.3 TABLE X2.1 |
| 7 | TABLE X2.2 |
