ASTM-E684 2004(Redline)
$23.40
E684-04 Standard Practice for Approximate Determination of Current Density of Large-Diameter Ion Beams for Sputter Depth Profiling of Solid Surfaces (Redline)
Published By | Publication Date | Number of Pages |
ASTM | 2004 | 2 |
Sputter depth profiling is used in conjunction with Auger electron spectroscopy, x-ray photoelectron spectroscopy, ion scattering spectroscopy, and secondary ion mass spectrometry to determine the chemical composition and atomic concentration as a function of distance from the surface of a specimen. See Guide E 1127.
The diameter of the ion beam used for sputtering must be specified and this practice is a relatively quick method of measuring the shape (that is, current density distribution) of the ion beam if a suitable Faraday cup is not available. 3
1. Scope
1.1 This practice describes a simple and approximate method for determining the shape and current density of ion beams. The practice is limited to ion beams of diameter greater than 0.5 mm of the type used for sputtering of solid surfaces to obtain sputter depth profiles. It is assumed that the ion-beam current density is symmetrical about the beam axis.
1.2 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.
2. Referenced Documents (purchase separately) The documents listed below are referenced within the subject standard but are not provided as part of the standard.
ASTM Standards
E673 Terminology Relating to Surface Analysis E1127 Guide for Depth Profiling in Auger Electron Spectroscopy E1577 Guide for Reporting of Ion Beam Parameters Used in Surface Analysis
Keywords
ion beam sputtering;
ICS Code
ICS Number Code 17.220.20 (Measurement of electrical and magnetic quantities)
DOI: 10.1520/E0684-04 ASTM International is a member of CrossRef.