BS ISO 16413:2013
$167.15
Evaluation of thickness, density and interface width of thin films by X-ray reflectometry. Instrumental requirements, alignment and positioning, data collection, data analysis and reporting
| Published By | Publication Date | Number of Pages |
| BSI | 2013 | 42 |
PDF Catalog
| PDF Pages | PDF Title |
|---|---|
| 6 | Foreword |
| 7 | Introduction |
| 9 | Section sec_1 Section sec_2 Section sec_2.1 1 Scope 2 Terms, definitions, symbols and abbreviated terms 2.1 Terms and definitions |
| 12 | Section sec_2.2 Section sec_3 Section sec_3.1 Section sec_3.1.1 2.2 Symbols and abbreviated terms 3 Instrumental requirements, alignment and positioning guidelines 3.1 Instrumental requirements for the scanning method |
| 13 | Table tab_b Figure fig_1 Table tab_c Figure fig_2 Section sec_3.1.2 Section sec_3.1.2.1 |
| 14 | Section sec_3.1.2.2 |
| 15 | Table tab_d Figure fig_3 |
| 16 | Section sec_3.1.3 Section sec_3.1.3.1 Section sec_3.1.3.2 Section sec_3.1.4 Section sec_3.1.5 |
| 17 | Section sec_3.2 Section sec_3.3 3.2 Instrument alignment 3.3 Specimen alignment |
| 19 | Table tab_e Figure fig_4 Section sec_4 Section sec_4.1 Section sec_4.2 Section sec_4.3 4 Data collection and storage 4.1 Preliminary remarks 4.2 Data scan parameters 4.3 Dynamic range |
| 20 | Section sec_4.4 Section sec_4.4.1 Section sec_4.4.2 Section sec_4.5 Section sec_4.6 4.4 Step size (peak definition) 4.5 Collection time (accumulated counts) 4.6 Segmented data collection |
| 21 | Section sec_4.7 Section sec_4.8 Section sec_4.9 Section sec_4.10 Section sec_4.10.1 Section sec_4.10.2 4.7 Reduction of noise 4.8 Detectors 4.9 Environment 4.10 Data storage |
| 22 | Section sec_5 Section sec_5.1 Section sec_5.2 Section sec_5.2.1 5 Data analysis 5.1 Preliminary data treatment 5.2 Specimen modelling |
| 23 | Section sec_5.2.2 Figure fig_5 Figure fig_6 |
| 24 | Section sec_5.3 Section sec_5.4 Table tab_f Figure fig_7 5.3 Simulation of XRR data 5.4 General examples |
| 25 | Table tab_g Figure fig_8 Table tab_h Figure fig_9 |
| 26 | Table tab_i Figure fig_10 Table tab_j Figure fig_11 |
| 27 | Table tab_k Figure fig_12 Section sec_5.5 5.5 Data fitting |
| 28 | Figure fig_13 |
| 29 | Section sec_6 Section sec_6.1 Section sec_6.2 6 Information required when reporting XRR analysis 6.1 General 6.2 Experimental details |
| 30 | Section sec_6.3 6.3 Analysis (simulation and fitting) procedures |
| 31 | Section sec_6.4 Section sec_6.4.1 Section sec_6.4.2 6.4 Methods for reporting XRR curves |
| 32 | Table tab_l Figure fig_14 Table tab_m Figure fig_15 |
| 33 | Table tab_n Figure fig_16 |
| 34 | Annex sec_A Annex A (informative) Example of report for an oxynitrided silicon wafer |
| 35 | Table tab_o Figure fig_A.1 |
| 36 | Table tab_A.1 Table tab_p Figure fig_A.2 |
| 37 | Table tab_q Figure fig_A.3 |
| 38 | Reference ref_1 Reference ref_2 Reference ref_3 Reference ref_4 Reference ref_5 Reference ref_6 Reference ref_7 Reference ref_8 Reference ref_9 Reference ref_10 Reference ref_11 Reference ref_12 Reference ref_13 Reference ref_14 Bibliography |
Related products
-
ISO 16413:2013
Evaluation of thickness, density and interface width of thin films by X-ray reflectometry — Instrumental…
