BS ISO 17331:2004+A1:2010
$142.49
Surface chemical analysis. Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy
| Published By | Publication Date | Number of Pages |
| BSI | 2010 | 28 |
| Status | Definitive |
|---|---|
| Pages | 28 |
| Publication Date | 2010-09-30 |
| ISBN | 978 0 580 64479 5 |
| Standard Number | BS ISO 17331:2004+A1:2010 |
| Title | Surface chemical analysis. Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy |
| Identical National Standard Of | ISO 17331:2004/AMD 1:2010 |
| Descriptors | Chemical analysis and testing, Surface chemistry, Silicon, Iron, X-ray fluorescence spectrometry, Control samples, Decomposition reactions, Fluorimetry, Spectrophotometry, Substrates (insulating), Nickel, Spectroscopy |
| Publisher | BSI |
| Committee | CII/60 |
| Amends | BS ISO 17331:2004 |
| ICS Codes | 71.040.40 - Chemical analysis |
