BS ISO 23170:2022
$167.15
Surface chemical analysis. Depth profiling. Non-destructive depth profiling of nanoscale heavy metal oxide thin films on Si substrates with medium energy ion scattering
Published By | Publication Date | Number of Pages |
BSI | 2022 | 38 |
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PDF Catalog
PDF Pages | PDF Title |
---|---|
2 | National foreword |
6 | Foreword |
7 | Introduction |
9 | 1 Scope 2 Normative references 3 Terms and definitions 4 Principle and recommendations of MEIS analysis |
10 | 5 MEIS analysis 6 MEIS spectra simulation |
13 | 7 Reporting MEIS analysis results |
14 | Annex A (informative) Interlaboratory test report |
27 | Annex B (informative) List of MEIS spectra simulation program sources and a procedure of MEIS spectra simulation using PowerMeis |
30 | Annex C (informative) Reliability of the IAEA electronic stopping power data |
32 | Annex D (informative) Fitting parameters A, B, C, D from the IAEA database |
37 | Bibliography |
Status | Definitive |
---|---|
Pages | 38 |
Publication Date | 2022-08-03 |
ISBN | 978 0 539 14473 4 |
Standard Number | BS ISO 23170:2022 |
Title | Surface chemical analysis. Depth profiling. Non-destructive depth profiling of nanoscale heavy metal oxide thin films on Si substrates with medium energy ion scattering |
Identical National Standard Of | ISO 23170 |
Descriptors | Control surfaces, Testing, Chemical methods of analysis, Chemical tests, Laboratories (chemical), Reactions (chemical) |
Publisher | BSI |
Committee | CII/60 |
ICS Codes | 71.040.40 - Chemical analysis |
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