ISO 23812:2009
$36.40
Analyse chimique des surfaces — Spectrométrie de masse des ions secondaires — Méthode pour l’étalonnage de la profondeur pour le silicium à l’aide de matériaux de référence à couches delta multiples
Published By | Publication Date | Number of Pages |
ISO | 2009-04 | 26 |
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L'ISO 23812:2009 spécifie un mode opératoire permettant l'étalonnage de l'échelle de profondeur dans une région de faible profondeur, inférieure à 50 nm, lors du profilage en profondeur SIMS à l'aide de matériaux de référence à couches delta multiples.
Elle ne s'applique pas à la région transitoire superficielle où la vitesse de pulvérisation n'est pas en régime permanent.
Elle s'applique au silicium monocristallin, au silicium polycristallin et au silicium amorphe.
Published Code | ISO |
---|---|
Published By | International Organization for Standardization |
Publication Date | 2009-04 |
Pages Count | 26 |
Language | France |
Edition | 1 |
File Size | 409.6 KB |
ICS Codes | 71.040.40 - Chemical analysis |
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