BSI 23/30442762 DC 2023
$13.70
BS ISO 8181. Atomic Layer Deposition. Terminology
| Published By | Publication Date | Number of Pages |
| BSI | 2023 | 18 |
PDF Catalog
| PDF Pages | PDF Title |
|---|---|
| 1 | 30442762-NC.pdf |
| 3 | ISO_DIS 8181 ed.1 – id.82998 Enquiry PDF (en) (1).pdf |
| 6 | Foreword |
| 7 | Introduction |
| 9 | 1 Scope 2 Normative references 3 Terms and definitions |
| 10 | 4 Terms – Atomic layer deposition 4.1 General terms |
| 11 | 4.2 Film growth of atomic layer deposition |
| 12 | 4.3 Classification of atomic layer deposition |
| 15 | Annex€A (informative) Example of Schematic diagram for time separated ALD and spatial ALD |
| 17 | Bibliography |
| 18 | Index |
