BSI PD ISO/TR 16268:2009
$142.49
Surface chemical analysis. Proposed procedure for certifying the retained areic dose in a working reference material produced by ion implantation
| Published By | Publication Date | Number of Pages |
| BSI | 2009 | 30 |
This Technical Report specifies a procedure for the certification of the areic dose of an ion-implanted analyte element of atomic number larger than that of silicon retained in a working reference material (WoRM) intended for surface-analytical use. The WoRM is in the form of a polished (or similarly smooth-faced) wafer (also referred to as the host), of uniform composition and nominal diameter 50 mm or more, that has been ion-implanted with nominally one isotope of a chemical element (also referred to as the analyte), not already present in the host, to a nominal areic dose normally within the range 1016 atoms/cm2 to 1013 atoms/cm2 (i.e. the range of primary interest in semiconductor technology). The areic dose of the ion-implanted analyte retained in the WoRM wafer is certified against the areic dose of the same analyte retained in an ion-implanted silicon wafer having the status of a (preferably certified) secondary reference material (SeRM).
Information is provided on the concept and the procedure for certification of the WoRM. There is also a description of the requirements for the reference materials, the comparative measurements and the actual certification. Supporting information on ion implantation, ion-implantation dosimetry, wavelength-dispersive X-ray fluorescence spectroscopy and non-certified substitutes for unobtainable SeRMs is provided in Annexes A to D. Sources and magnitudes of uncertainties arising in the certification process are detailed in Annex E.
PDF Catalog
| PDF Pages | PDF Title |
|---|---|
| 9 | Scope Normative references Terms and definitions |
| 13 | Symbols and abbreviated terms |
| 14 | Concept and procedure General information |
| 16 | Preparation of the working and transfer reference materials Measurement of retained areic dose in the transfer reference Compatibility of the working reference material and the surf |
| 17 | Requirements Reference materials Instrumentation requirements Ion implanter Wavelength-dispersive X-ray fluorescence spectrometer |
| 18 | Electron microprobe Ion-implantation requirements Uniformity requirement Certification Working reference material against the transfer reference ma Transfer reference material against the secondary reference |
| 19 | Retained areic dose of the working reference material |
