{"id":58341,"date":"2024-10-17T10:46:40","date_gmt":"2024-10-17T10:46:40","guid":{"rendered":"https:\/\/pdfstandards.shop\/product\/uncategorized\/astm-e2245-2011\/"},"modified":"2024-10-24T17:32:12","modified_gmt":"2024-10-24T17:32:12","slug":"astm-e2245-2011","status":"publish","type":"product","link":"https:\/\/pdfstandards.shop\/product\/publishers\/astm\/astm-e2245-2011\/","title":{"rendered":"ASTM-E2245 2011"},"content":{"rendered":"<\/p>\n
1.1 This test method covers a procedure for measuring the compressive residual strain in thin films. It applies only to films, such as found in microelectromechanical systems (MEMS) materials, which can be imaged using an interferometer. Measurements from fixed-fixed beams that are touching the underlying layer are not accepted.<\/p>\n
1.2 This test method uses a non-contact optical interferometer with the capability of obtaining topographical 3-D data sets. It is performed in the laboratory.<\/p>\n
1.3 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.<\/i><\/p>\n
PDF Pages<\/th>\n | PDF Title<\/th>\n<\/tr>\n | ||||||
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1<\/td>\n | Scope Referenced Documents Terminology <\/td>\n<\/tr>\n | ||||||
4<\/td>\n | Summary of Test Method FIG. 1 <\/td>\n<\/tr>\n | ||||||
5<\/td>\n | Significance and Use FIG. 2 FIG. 3 <\/td>\n<\/tr>\n | ||||||
6<\/td>\n | Interferences FIG. 4 FIG. 5 <\/td>\n<\/tr>\n | ||||||
7<\/td>\n | Test Units FIG. 6 TABLE 1 <\/td>\n<\/tr>\n | ||||||
8<\/td>\n | Procedure ( <\/td>\n<\/tr>\n | ||||||
9<\/td>\n | FIG. 7 <\/td>\n<\/tr>\n | ||||||
10<\/td>\n | FIG. 8 FIG. 9 <\/td>\n<\/tr>\n | ||||||
11<\/td>\n | FIG. 10 <\/td>\n<\/tr>\n | ||||||
12<\/td>\n | Calculation ( FIG. 11 <\/td>\n<\/tr>\n | ||||||
13<\/td>\n | FIG. 12 FIG. 13 <\/td>\n<\/tr>\n | ||||||
15<\/td>\n | Report Precision and Bias <\/td>\n<\/tr>\n | ||||||
16<\/td>\n | Keywords TABLE 2 FIG. 14 <\/td>\n<\/tr>\n | ||||||
17<\/td>\n | FIG. 15 FIG. 16 <\/td>\n<\/tr>\n | ||||||
18<\/td>\n | A1. CALCULATION OF COMBINED STANDARD UNCERTAINTY A1.1 A1.2 A1.3 A1.4 A1.5 A1.6 A1.7 A1.8 A1.9 A1.10 <\/td>\n<\/tr>\n | ||||||
19<\/td>\n | TABLE A1.1 <\/td>\n<\/tr>\n | ||||||
20<\/td>\n | A1.11 A1.12 A1.13 A1.14 A1.15 TABLE A1.2 TABLE A1.3 TABLE A1.4 <\/td>\n<\/tr>\n | ||||||
21<\/td>\n | X1. ADHERENCE OF SURFACE-MICROMACHINED FIXED-FIXED BEAM TO UNDERLYING LAYER X1.1 FIG. X1.1 <\/td>\n<\/tr>\n | ||||||
22<\/td>\n | FIG. X1.2 FIG. X1.3 <\/td>\n<\/tr>\n | ||||||
23<\/td>\n | REFERENCES FIG. X1.4 <\/td>\n<\/tr>\n<\/table>\n","protected":false},"excerpt":{"rendered":" E2245-11 Standard Test Method for Residual Strain Measurements of Thin, Reflecting Films Using an Optical Interferometer<\/b><\/p>\n |